Molybdenum Sputtering Targets for Complex Assembly

Product Details
Application: Aviation, Electronics, Industrial, Medical, Chemical
Standard: JIS, GB, DIN, BS, ASTM, AISI
Purity: >99.95%
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Number of Employees
9
Year of Establishment
2014-03-27
  • Molybdenum Sputtering Targets for Complex Assembly
  • Molybdenum Sputtering Targets for Complex Assembly
  • Molybdenum Sputtering Targets for Complex Assembly
  • Molybdenum Sputtering Targets for Complex Assembly
  • Molybdenum Sputtering Targets for Complex Assembly
  • Molybdenum Sputtering Targets for Complex Assembly
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  • Overview
  • FAQ
  • Company Profile
Overview

Basic Info.

Model NO.
Mo Target
Alloy
Non-alloy
Type
Molybdenum Plate
Powder
Not Powder
MOQ
3kg
Delivery Time
with 15 Days After Received Payment
Shipping Details
by Sea / by Air
Key Word
Molybdenum Discs
Market
Global
Weight
≤200kg/PC
Length
≤Φ165mmΧ1000mm
Transport Package
Wooden Box
Specification
Customized
Trademark
Luoyang Bless
Origin
China
HS Code
8102990000
Production Capacity
5000kg/Month

Product Description

Molybdenum Sputtering Targets

Description:
Molybdenum sputtering targets are widely used in manufacturing LCD and touch screens (panels). They are also used for solar cells and solar water heating. We can provide pure molybdenum and molybdenum alloy targets in different shapes, including disc, planar, rotary, and custom targets.
Molybdenum Sputtering Targets for Complex Assembly

Application:
Sputtering is a physical vapor deposition (PVD) method in which the evaporated target material is deposited onto the surface of the substrate, forming a thin film layer.
Sputtering is the preferred vacuum deposition technique used by manufacturers of semiconductors, CDs, disk drives, and optical devices. It is used extensively in the semiconductor industry to deposit thin films of various materials in integrated circuit processing. Thin anti-reflection coatings on glass for optical applications are also deposited by sputtering. Sputtered films exhibit excellent uniformity, density, purity, and adhesion.


Operating Principle:
Sputtering target materials for magnetron sputtering deposition is a new kind of physical vapor deposition (PVD) method
Add orthogonal magnetic and electric fields In the sputtering target's anode and cathode, and fill the gas (usually the Ar gas) In the high vacuum chamber
Ar gas ionization into positive ions and electrons. Under the action of the electric field, the Target has a certain negative pressure, Electronic affected by the magnetic field and its Ionization probability increases with a working gas, then forming a high density of plasma near the cathode, Ar ion under the action of Lorentz force, speed up fly to the target surface, bombarding target surface at a high speed, making atoms sputtering from target fly to the substrate deposition film.


Specification:
The Molybdenum sputtering targets we can provide are as follows:
Plate Target: Weight:≤200kg/pc, Purity:≥99.95%
Tube Target: Length:≤Φ165mmΧ1000mm ,Purity:≥99.95%


We can supply molybdenum targets as per customers' requests.
If there are any other specs, please contact us with no hesitation!

 
FAQ

Where Is Your Factory Located?
There is a saying that "Tungsten town, looking for Luoyang". Our factory is located in Luoyang, a Midwestern city in China. A strategic position with the world's largest reserve of molybdenum and the second-highest source of tungsten globally.



Why Is Your Product So Cost-Effective?
We cut out the middlemen in the end-to-end manufacturing process. Rather than obtaining semi-finished goods from other suppliers, we obtain our raw material of APT powder directly from its source.

 
 
Do You Do Spot Quality Checks Or Full Checks?
100% full inspection. Inspectors will check the finished product individually, to ensure they adhere to all parameters. All unqualified products are discarded.


How Do You Ensure Your Lead Time?
We have an efficient Order Management System, from material preparation to machining, and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.


 
Company Profile

We are Luoyang Bless Tungsten Molybdenum Material CO., Ltd in China. We are the main manufacturer of tungsten and molybdenum materials, and our products have been exported for many years. Located in Luoyang, Henan province, which is the number one reserve of tungsten minerals in China, we have a unique advantage in sourcing the highest quality materials.


Over the past 20 years, BLESS focused on the Molybdenum and Tungsten powder process, which refining Ammonium Molybdate powder and ammonium Tungstate powder into Molybdenum and Tungsten powder. Since 2002s, we have been engaged in the production of Tungsten and Molybdenum products, such as rods, sheets, wire, crucibles, target-shaped products also deep processes according to customized products. Our products are exported to Germany, Japan, USA, Brazil, India etc and always get good feedback from them. Wide production scale and difficult process of customized products are our advantages.

One of our main strengths is our strict quality control process. We utilize SEMS technology to inspect the interior structure of every batch of raw rods. If any rods are found to have cracks or defects, they are immediately rejected. Additionally, we have our R&D laboratory dedicated to tungsten, ensuring continuous improvement in our products.

Furthermore, we have a fully automated production line. Every step is efficiently processed by machines. This guarantees a uniform quality standard and enables us to meet our customers' lead time requirements.

As a global supplier, we strive to provide the best tungsten and molybdenum materials to our customers. With our advantageous location, strict quality control, and automated production line, we are confident in our ability to meet your needs and exceed your expectations. Whether you require tungsten and molybdenum products for industrial applications or research purposes, we are here to provide you with reliable and cost-effective solutions.

Content update time:2024.11.11

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